Application of Reduced-rank Multivariate Methods to the Monitoring of Spatial Uniformity of Wafer Etching

نویسندگان

  • Michael Nikolaou
  • Andrew D. Bailey
چکیده

We provide a smooth introduction to reduced-rank analysis via singular-value decomposition, and show how it can be used to monitor images of etched silicon wafers. An industrial case study is discussed.

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تاریخ انتشار 2002